Plasma Deposited Inorganic Thin Films for Optical Applications

Plasma deposited thin films, widely used in semiconductor processing, have begun to be used in optical applications such as anti-reflective coatings and optical waveguides. Amorphous films of refractory materials such as SiO2, SiC, and Si3N4 have been applied with high optical perfection on substrates at 200--300°C with this process. Control of index of refraction has been achieved by selecting appropriate deposition parameters.